The NuPure III gas purification instrument NuPure IIII gas purification equipment and instruments 1996, NuPure company established a major supplier of the Charter of the gas purifier to analyze the industry. By the end of 1997, NuPure expansion of its products by taking over in the permit, a complete line of gas purification and particle filter, from the ultra-pure? Systems, Inc., the company's Colorado Springs. 1998 - 2001 period, we add to the advantages of our technology, licensed exclusively through five new patents gas purification. In 2002, we developed in-house design of the new purifier new optical applications, validation and ppt level performance. The manufacturing of NuPure also experienced a shift from external to internal. Initially, the purifier is ultrapure system ("private label"). End of 1997, our owners to build tomorrow's metal LLC in Colorado Springs, Colorado, manufacturing gas purifier and filter is designed for the NuPure tab. In July 2002 NuPure moved to a larger facility in Ottawa. This allows the expansion and integration of all of its operations. In September 2002, we buy and relocation of production equipment and inventory causes, measurement and front / Power systems purifier Group. 2003, we have successfully established our own state-of-the-art manufacturing, gas analysis and research capabilities, all under the same roof. Because the unique concern NuPure gas purification and filtration, our reputation has grown into a quality supplier of these products are semiconductor and analysis industry. The company is headquartered in Ottawa, Canada, and distributors in North America, Europe and Asia, we are willing to support our global customers. NuPure Eliminator Model 600 CA FEATURES Removal of impurities to <1 ppb No heaters or power required Room-temperature operation 316L SS (<10 Ra EP) vessel Factory regenerable for up to 10 year life Field regenerable for up to 10 year life Improved process equipment performance Optional built-in 0.003 μm filter (PF type) High Flow - up to 2500 slpm Lowest cost (initial and operating) to remove impurities, <1 ppb no heating or power requirements to operate at room temperature (<10 Ra EP), 316 L SS container factory form suitable for up to 10 years in the field of life form suitable for up to 10 years of life improvement process equipment performance optional built-in the 0.003μm filters (PF type) high flow - 2500 slpm lowest cost (initial and operating) Gaseous Impurities to sub-ppb levels at room H2O, O2, CO, CO2, H2 and NMHC's to <1 ppb from any inert gas (Nitrogen, Argon, Helium, Krypton, Neon and Xenon) and H2O, O2 and CO2 from Hydrogen. They are Ideally Suited to the room water purifying gases from Liquid sources of gaseous impurities connector ppb level, O2, CO, CO2, H2 and NMHC <1 ppb from any inert gas (nitrogen, argon, helium, krypton, neon and xenon) and H2O, O2 and CO2 hydrogen. They are suitable for gas purification from liquid sources hemistry Represents a major improvement over Catalyst-only purifiers. For example, the Moisture than twice the Moisture Capacity of the Aeronex Model 500! Hemistry represents a major catalyst for improvement only purifier. For example, the water twice Aeronex humidity Model 500! Standard size ranges from 0 to 2500 slpm, with the high-flow purifier Versions especially suitable for applications such as welding or Purging The use of optional factory-installed Inlet isolation valve (shown in photo) is recommended for Elimination of Possible operator error during Installation standard sizes range from 0 to 2500 slpm particularly suitable for high-speed flow purifier version of the application (such as welding or clear the factory imported using the optional isolation valve (see Figure) proposal to abolish the possible operational errors during installation Applications Gas Cylinder Cabinets Gas Analyzer Carts Research and Development semiconductor industry, high purity welding inert gas purification cylinder cabinet